发明名称 |
OPTICAL SYSTEM OF AN ILLUMINATION DEVICE OF A PROJECTION EXPOSURE APPARATUS |
摘要 |
The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, comprising at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.
|
申请公布号 |
US2007217013(A1) |
申请公布日期 |
2007.09.20 |
申请号 |
US20070685620 |
申请日期 |
2007.03.13 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
SCHUSTER KARL-HEINZ;HARTMAIER JUERGEN;MAUL MANFRED;SCHMEREK DIETER;MUELLER DETLEV;HAHNEMANN OTTO;MARIANEK FRANK;WEISS GUNDULA;FIOLKA DAMIAN |
分类号 |
G02B5/18 |
主分类号 |
G02B5/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|