发明名称 METHOD AND APPARATUS OF MANUFACTURING MAGNETIC SEMICONDUCTOR
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a magnetic semiconductor that exhibits a magnetic characteristic at room temperature or higher. <P>SOLUTION: This method and an apparatus are used to manufacture a magnetic semiconductor by applying a laser to a semiconductor to which magnetic atoms are introduced. In this case, while a magnetic field is applied to the surface of the semiconductor 1a having the magnetic atoms, the laser is given thereto. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008262961(A) 申请公布日期 2008.10.30
申请号 JP20070102530 申请日期 2007.04.10
申请人 IHI CORP 发明人 KAWAGUCHI NORIHITO;KAWAKAMI RYUSUKE;NISHIDA KENICHIRO;MORITA MASARU
分类号 H01F41/30;H01F1/40;H01F10/193;H01L21/265 主分类号 H01F41/30
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