发明名称 SUBSTRATE HOUSING BOX, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal device, by which a retardation layer excellent in optical characteristics can be formed by a simple method. <P>SOLUTION: The method for manufacturing a liquid crystal device includes a step of forming a retardation layer on a substrate, wherein the step of forming the retardation layer includes: a step of housing a substrate 50 which is coated with a forming material of the retardation layer in a substrate housing box 10 having a light transmitting part capable of transmitting UV rays, and replacing the inside of the substrate housing box 10 by inert gas; and a step of irradiating the substrate 50 with UV rays from a light source 30 through the light transmitting part (a cap 12) of the substrate housing box 10. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008268633(A) 申请公布日期 2008.11.06
申请号 JP20070112787 申请日期 2007.04.23
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO
分类号 G03F7/20;G02B5/30;G02F1/13363 主分类号 G03F7/20
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