| 摘要 |
A semiconductor manufacturing apparatus according to an embodiment comprises: an epitaxial growth part for growing an epitaxial layer on a surface of a wafer; a pumping part for pumping the first fluid discharged from the epitaxial growth part; a scrubber for collecting the first fluid; and a first pressure control part for reducing the discharge pressure of the pumping part using the second fluid by venturi effect. The present invention can reduce the power consumption of the pumping part by reducing the pressure on a side of discharging part of the pumping part through a pressure control part. |
