发明名称 Stacked chip device
摘要 The present disclosure relates to a stacked chip device including a first stack unit comprising a plurality of electrode patterns respectively disposed for a unit device region and common electrode patterns formed to be connected to cross the unit device regions, a second stack unit disposed on a top portion of the first stack unit and comprising a plurality of first conductor patterns, and a third stack unit disposed on a bottom portion of the first stack unit and comprising a plurality of second conductor patterns, wherein the first and second conductor patterns are formed on a plurality of sheets, the first and second conductor patterns formed on one sheet are formed across a plurality of unit device regions, and the first and second conductor patterns are connected vertically through vias formed penetrating through at least some of the sheets.
申请公布号 US9431988(B2) 申请公布日期 2016.08.30
申请号 US201514608115 申请日期 2015.01.28
申请人 INNOCHIPS TECHNOLOGY CO., LTD. 发明人 Park In Kil;Noh Tae Hyung;Kim Gyeong Tae;Seo Tae Geun;Lee Myung Ho;Lee Min Soo
分类号 H03H7/01;H03H1/00 主分类号 H03H7/01
代理机构 代理人
主权项 1. A stacked chip device comprising: a first stack unit comprising a plurality of electrode patterns respectively disposed for a unit device region and common electrode patterns formed to be connected to cross the unit device regions; a second stack unit disposed on a top portion of the first stack unit and comprising a plurality of first conductor patterns; and a third stack unit disposed on a bottom portion of the first stack unit and comprising a plurality of second conductor patterns, wherein the first and second conductor patterns are formed on a plurality of sheets, the first and second conductor patterns formed on one sheet are formed across a plurality of unit device regions, and the first and second conductor patterns are connected vertically through vias formed penetrating through at least some of the sheets, and wherein the vias comprise first central vias formed on central portions of the first conductor patterns and second central vias formed on central portions of the second conductor patterns, and central axes of the first and second central vias are separated from each other.
地址 KR
您可能感兴趣的专利