发明名称 CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要 The present invention relates to a control system configured to control a parameter (F) of a dynamic system, wherein the parameter depends on an output signal (g(F(k))). The control system comprises a set-point generator and a feedforward, wherein the setpoint generator is arranged to provide a set-point signal (F(k)) to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
申请公布号 NL2016797(A) 申请公布日期 2016.12.22
申请号 NL20162016797 申请日期 2016.05.19
申请人 ASML NETHERLANDS B.V. 发明人 JEROEN JOHANNES THEODORUS HENDRIKUS DE BEST;WILHELMUS HENRICUS THEODORUS MARIA AANGENENT;STAN HENRICUS VAN DER MEULEN
分类号 G03F7/20 主分类号 G03F7/20
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