发明名称 |
CONTROL SYSTEM, POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
The present invention relates to a control system configured to control a parameter (F) of a dynamic system, wherein the parameter depends on an output signal (g(F(k))). The control system comprises a set-point generator and a feedforward, wherein the setpoint generator is arranged to provide a set-point signal (F(k)) to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter. |
申请公布号 |
NL2016797(A) |
申请公布日期 |
2016.12.22 |
申请号 |
NL20162016797 |
申请日期 |
2016.05.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JEROEN JOHANNES THEODORUS HENDRIKUS DE BEST;WILHELMUS HENRICUS THEODORUS MARIA AANGENENT;STAN HENRICUS VAN DER MEULEN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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