| 摘要 |
PURPOSE:To suppress warping of a medium due to changes in temp. or humidity by applying and hardening an org. silicon compd. only on the opposite side to the recording film side of the substrate so as to form a first film, and then forming a silicon dioxide film thereon. CONSTITUTION:The first film is formed by applying and hardening an org. silicon compd. only on the opposite side to the groove side of a transparent substrate. Then a silicon dioxide film is formed on th;e first film comprising the org. silicon compd. by bringing the substrate into contact with a hydrosilicofluoric acid aq. soln. in a supersaturated state of silicon dioxide to cause precipitation. By this method, the silicon dioxide film can be formed into almost same thickness as that of the total film thickness of the recording film side. Thereby, warping of the medium due to changes in temp. or humidity can be suppressed. |
