PHOTOSENSITIVE TRANSFER SHEET AND FORMING METHOD FOR RESIST PATTERN

摘要

PURPOSE:To obtain a photosensitive transfer sheet having a photosensitive resin layer and a temporary supporting body which is free from deposition of dust or the like on the photosensitive resin layer when the temporary supporting body is peeled from a laminated body consisting of the photosensitive transfer sheet and a supporting body to which the photosensitive resin layer is to be transferred. CONSTITUTION:This photosensitive transfer sheet consists of a synthetic resin temporary supporting body 2, a barrier-type peeling layer 3 or a peeling layer and barrier layer, and an alkali-developing photosensitive resin layer 4 in this order laminated on the supporting body 2. The temporary supporting body 2 has <=10<13>OMEGA/square surface electric resistance. A resist pattern is formed by using this photosensitive transfer sheet 1 and transferring the photosensitive resin layer 4 on a supporting body.