发明名称 SINTERED POWER SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To introduce a power semiconductor substrate having a slight deflection, and to present a simple and inexpensive method of manufacturing such a power semiconductor device. <P>SOLUTION: At least one sequence layer, which comprises thin adhesion mediation layers (20, 22, 24), sintered metal layers (30, 32, 34), and wiring layers (40, 42, 44), is arranged on at least one of main surfaces (120, 122) in a flat insulating base body (12). An auxiliary method includes four main steps, namely a step for covering at least a partial surface of at least one main surface in the flat insulating base body, a step for arranging a paste-like layer made of sintered metal and a solvent on the partial or entire surface of the adhesion mediation layer, a step for arranging the wiring layer on the sintered metal layer, and a step for energizing the wiring layer on the power semiconductor substrate (10) with pressure. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008283184(A) 申请公布日期 2008.11.20
申请号 JP20080122170 申请日期 2008.05.08
申请人 SEMIKRON ELEKTRONIK GMBH & CO KG 发明人 GOEBL CHRISTIAN;BRAML HEIKO;HERMANN ULRICH
分类号 H01L23/13;H01L23/12 主分类号 H01L23/13
代理机构 代理人
主权项
地址