发明名称 Process for the direct metallization of nonconductive substrates
摘要 A non-conducting substrate is metallized by contacting the substrate with a metal-containing activator solution and then with a metal salt solution, and plating the treated substrate with a metal. The metal salt solution comprises metal(s) which can be reduced by the metal of the activator solution, a complexing agent, and metal salt(s) having a metal chosen from lithium, sodium, calcium, ruthenium and cesium in the form of a salt chosen from fluoride, chloride, iodide, bromide, nitrate and sulfate. An independent claim is included for metal salt solution.
申请公布号 EP1734156(A1) 申请公布日期 2006.12.20
申请号 EP20060011977 申请日期 2006.06.09
申请人 ENTHONE, INC. 发明人 KÖNIGSHOFEN, ANDREAS;MÖBIUS, ANDREAS
分类号 C25D5/54;C23C18/16;C23C18/20;C23C18/28;C23C18/30;C23C18/31;H05K3/18 主分类号 C25D5/54
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