发明名称 LEATHER ON WHICH PATTERN IS FORMED AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a leather, on which design is imparted and a pattern excellent in abrasion resistance and following tensile force without causing crack of cured film is formed, and to provide a method for producing the leather. <P>SOLUTION: The leather on which a pattern is formed is obtained by forming a protruded pattern by an ultraviolet-curing film on the leather, the protruded pattern being formed of at least two kinds of ultraviolet-curing films which are different in Martens' hardness. It is preferable that the protruded pattern is formed of two kinds of ultraviolet-curing films which are different in Martens' hardness and the interior of the protruded pattern is formed mainly of an ultraviolet-curing film whose Martens' hardness is soft and the exterior of the protruded pattern is formed mainly of an ultraviolet-curing film whose Martens' hardness is hard when the protruded pattern is viewed from the vertical section. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008280449(A) 申请公布日期 2008.11.20
申请号 JP20070126689 申请日期 2007.05.11
申请人 SEIREN CO LTD 发明人 YAMAGUCHI AKIRA
分类号 C14B1/56;B41J2/01;B41M5/00 主分类号 C14B1/56
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