| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device and a proximity exposure method, capable of improving exposure accuracy by surely preventing distortion of a mask through a relatively simple structure. <P>SOLUTION: In the proximity exposure device PE, an elastically deformable seal member 23 is provided on a work stage 1 so as to surround the circumference of a substrate W held thereon. The seal member 23 can contact with a held mask M held on a mask stage 2 when either one of the work stage 1 and the mask stage 2 is moved closer to each other so that the clearance between the mask M and the substrate W becomes an exposure gap g, and closely seals the clearance space between the mask M and the substrate W to raise the pressure in the clearance space higher than the pressure on the upper side of the mask M. <P>COPYRIGHT: (C)2009,JPO&INPIT |
