| 摘要 |
Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metal or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing micro/nano-bubbles of gas and having a temperature maintained at 30°C to 90°, the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or lower, preferably 30 nm or lower, and also preferably the density of such bubbles being 108 or more bubbles per 1 ml. |
