发明名称 Quartz glass crucible, method for producing the same, and method for producing silicon single crystal
摘要 Described herein is a method for producing a quartz glass crucible, including the steps of: preparing a crucible base material that is made of quartz glass and has a crucible shape; producing a synthetic quartz glass material by the direct process or the soot process; processing the synthetic quartz glass material into a crucible shape without pulverizing the synthetic quartz glass material; and welding the synthetic quartz glass material processed into the crucible shape to the inner surface of the crucible base material. As a result, there are provided a quartz glass crucible that avoids generation of dislocation in a silicon single crystal, the generation of dislocation caused by the crucible itself, at the time of production of a silicon single crystal and has high heat resistance, a method for producing the quartz glass crucible, and a method for producing a silicon single crystal, the method using such a quartz glass crucible.
申请公布号 US9376336(B2) 申请公布日期 2016.06.28
申请号 US201113824874 申请日期 2011.09.26
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 Kimura Akihiro;Matsumoto Suguru;Fusegawa Izumi;Miki Katsuhiko
分类号 C30B15/02;C03B20/00;C30B15/08;C03B19/09;C03B19/14;C03B23/20;C30B15/10;C30B29/06 主分类号 C30B15/02
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A method for producing a quartz glass crucible, comprising the steps of: preparing a crucible base material that is made of quartz glass and has a crucible shape; producing a synthetic quartz glass material by a direct process or a soot process; processing the synthetic quartz glass material into a crucible shape without pulverizing the synthetic quartz glass material; and welding the synthetic quartz glass material processed into the crucible shape to an inner surface of the crucible base material wherein the welding is performed as the same time by the application of heat performed when the synthetic quartz glass material processed into the crucible shape is placed inside the crucible base material, the inside of the synthetic quartz glass material is filled with polycrystalline silicon, and the polycrystalline silicon is melted in a silicon single crystal pulling apparatus.
地址 Tokyo JP