发明名称 Semiconductor Device
摘要 A semiconductor device includes: a p-type semiconductor layer; an n-type semiconductor layer; a first electrode layer; a second electrode layer; and a control electrode layer. The first and second electrode layers are electrically connected such as to each operate at an identical potential. The first electrode layer is connected with a part of a surface of the second electrode layer which is opposite to a surface of the second electrode layer that is in contact with the p-type semiconductor layer. The second electrode layer is connected with a connection line which is a part of a peripheral line of a joint interface between the p-type semiconductor layer and the n-type semiconductor layer on an interface side between the second electrode layer and the p-type semiconductor layer, and is formed to be extended to a position on a control electrode layer side of the connection line.
申请公布号 US9391150(B2) 申请公布日期 2016.07.12
申请号 US201314104980 申请日期 2013.12.12
申请人 Toyoda Gosei Co., Ltd. 发明人 Oka Toru;Tanaka Nariaki
分类号 H01L31/072;H01L29/417;H01L29/78;H01L29/45;H01L29/66;H01L29/20;H01L21/04;H01L21/285;H01L29/16 主分类号 H01L31/072
代理机构 McGinn IP Law Group, PLLC 代理人 McGinn IP Law Group, PLLC
主权项 1. A semiconductor device, comprising: a p-type semiconductor layer; an n-type semiconductor layer connected with the p-type semiconductor layer; a first electrode layer formed on the n-type semiconductor layer; a second electrode layer formed on the p-type semiconductor layer and connected to ground; and a control electrode layer formed above the p-type semiconductor layer, wherein the first electrode layer and the second electrode layer are electrically connected such as to each operate at an identical potential, the first electrode layer is formed on or over the second electrode layer, the second electrode layer is situated on a connection line which is a part of a peripheral line of an interface between the p-type semiconductor layer and the n-type semiconductor layer, and is formed on the n-type semiconductor layer and is extended towards the control electrode layer, and the second electrode layer includes an end portion contacting an upper surface of the n-type semiconductor layer, and the first electrode layer includes an end portion formed on the end portion of the second electrode layer and contacting the upper surface of the n-type semiconductor layer.
地址 Kiyosu-shi, Aichi-ken JP