ATOMIC LAYER DEPOSITION APPARATUS

摘要

Disclosed is a large area atomic layer deposition apparatus capable of processing a large area substrate. The large area atomic layer deposition apparatus includes: a process chamber; a susceptor which is installed inside the process chamber, wherein a plurality of substrates are disposed in a circular shape; and a gas supply part which is installed on the susceptor and is formed to circulate and flow deposition gas along a circumferential direction of the susceptor.