发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the electrical characteristics of a transistor by adjusting the physical property values of an oxide semiconductor layer, since the correlation of the electrical characteristics of a transistor using an oxide semiconductor layer, and the physical property values of the oxide semiconductor layer is not clear yet, because the field of an oxide semiconductor layer is a field began to receive attention in recent years.SOLUTION: A semiconductor device has at least a gate electrode, an oxide semiconductor layer, and a gate insulation layer sandwiched between the gate electrode and oxide semiconductor layer, where the oxide semiconductor layer has a relative dielectric constant of 13 or more (or 14 or more).SELECTED DRAWING: Figure 2
申请公布号 JP2016195291(A) 申请公布日期 2016.11.17
申请号 JP20160163315 申请日期 2016.08.24
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MIYANAGA SHOJI;HONDA TATSUYA
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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