Method for manufacturing nano-structured semiconductor light-emitting element

摘要

There is provided a method for manufacturing a nanostructure semiconductor light emitting device, including: forming a mask having a plurality of openings on a base layer; growing a first conductivity-type semiconductor layer on exposed regions of the base layer such that the plurality of openings are filled, to form a plurality of nanocores; partially removing the mask such that side surfaces of the plurality of nanocores are exposed; heat-treating the plurality of nanocores after partially removing the mask; sequentially growing an active layer and a second conductivity-type semiconductor layer on surfaces of the plurality of nanocores to form a plurality of light emitting nanostructures, after the heat treatment; and planarizing upper parts of the plurality of light emitting nanostructures such that upper surfaces of the nanocores are exposed.

主权项

1. A method for manufacturing a nanostructure semiconductor light emitting device, the method comprising:
forming a mask having a plurality of openings on a base layer; growing a first conductivity-type semiconductor layer on exposed regions of the base layer such that the plurality of openings are filled, to form a plurality of nanocores; partially removing the mask such that side surfaces of the plurality of nanocores are exposed; sequentially growing an active layer and a second conductivity-type semiconductor layer on surfaces of the plurality of nanocores to form a plurality of light emitting nanostructures; forming a contact electrode on surfaces of the plurality of light emitting nanostructures, the contact electrode forming ohmic-contact with the second conductivity-type semiconductor layer; planarizing upper parts of the plurality of light emitting nanostructures such that upper surfaces of the nanocores are exposed; and partially removing the contact electrode such that the contact electrode has a height lower than upper surfaces of the light emitting nanostructures.