发明名称 SYNTHETIC RESIN SKIN MATERIAL AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a synthetic resin skin material which has a fine crimp pattern close to a natural leather, and suppresses occurrence of unnatural gloss in a skin layer and poor appearance caused by occurrence of air bubbles and the like, and to provide an easy method for producing the same.SOLUTION: There is provided a synthetic resin skin material 10 having an adhesive layer 14 and a skin layer 18 sequentially provided on a substrate 12, where the skin layer 18 has a first crimp pattern 18A formed of unevenness of the skin layer 18 and a second crimp pattern 18B which is contained in the first crimp pattern and has a smaller size than that of the first crimp pattern in plan view, and the second crimp pattern has a projection communicating with a formation region of the second crimp pattern.SELECTED DRAWING: Figure 1
申请公布号 JP2016196102(A) 申请公布日期 2016.11.24
申请号 JP20150075805 申请日期 2015.04.02
申请人 KYOWA LEATHER CLOTH CO LTD 发明人 YAMAMOTO AKIRA
分类号 B32B3/30;B29C59/04 主分类号 B32B3/30
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