发明名称 CHARGED PARTICLE BEAM DRAWING APPARATUS, AND CHARGED PARTICLE BEAM DRAWING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a drawing apparatus and method in which an error of beam size or drawing position is reduced. <P>SOLUTION: The drawing apparatus 100 includes an electron gun 201, a magnetic disc drive 109 for storing drawing data, a section 122 for calculating an initial digital deflection amount for deflecting an electron beam 200, a section 124 for making the initial digital deflection amount integer in predetermined unit so that at least one has a value different by 1 from others for first through n-th drawings, a DAC 126 for converting the first through n-th digital deflection amounts represented in integers into the first through n-th analog deflection amounts, and a forming deflector 205 for deflecting the electron beam 200 based on an analog deflection amount corresponding to each drawing at the time of first through n-th drawings. According to the invention, an error rounded in a predetermined unit can be reduced. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008300569(A) 申请公布日期 2008.12.11
申请号 JP20070144003 申请日期 2007.05.30
申请人 NUFLARE TECHNOLOGY INC 发明人 ABE TAKAYUKI
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
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