发明名称 METHOD FOR FORMING ELECTRODE PATTERN
摘要 PROBLEM TO BE SOLVED: To form an electrode only on the upper surface of a groove by pattern exposing a photosensitive glass board, forming the photoresist pattern of the undercut second pattern, etching to form the groove, forming metal films on the photoresist pattern and the groove, and lifting off the photoresist pattern. SOLUTION: A photosensitive glass board 11 is pattern exposed by using a photomask 12. The exposed region is crystallized by a heat development. A photoresist 13 is formed on the crystallized region 11a, and pattern exposed by using a photomask 14. In this case, the pattern of the photomask 14 is formed undersize of the pattern of the region 11a. Then, it is developed to form a photoresist pattern 13a, and the region 11a is etched to form a groove 11b. Thereafter, metal films 15a, 15b are formed on the pattern 13a and the groove 11b. The pattern 13a and the film 15a formed on the pattern 13a are removed by a lift-off method.
申请公布号 JPH0957982(A) 申请公布日期 1997.03.04
申请号 JP19950213396 申请日期 1995.08.22
申请人 SEIKOSHA CO LTD 发明人 KONDO YOSHIHIRO
分类号 B41J2/045;B41J2/055;B41J2/16;B41J2/385;G03F7/26;G03F7/40;(IPC1-7):B41J2/16 主分类号 B41J2/045
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