发明名称 ETHYLENE GLYCOL SLURRY, AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain the subject slurry without using a dispersant by dispersing, in an ethylene glycol solution, fine particles of amorphous silica produced by the DC arc plasma method to have an average particle size in a specific range. SOLUTION: This slurry is obtained by dispersing, in an ethylene glycol solution, fine particles of amorphous silica produced by the DC arc plasma method to have an average particle size of 8 to 65 nm preferably at 1 to 25 wt.%, more preferably 5 to 20 wt.%. It is preferable that the fine particles are added in ethylene glycol and then ultrasonically treated. The resultant slurry is added to a polyester polymerization stock at 0.01 to 3 wt.% as the fine silica particles, and the mixture is subjected to the polymerization to produce a polyester resin. A biaxially stretched polyester resin film can be obtained by extruding the polyester resin into film and biaxially stretching the film.
申请公布号 JP2000336155(A) 申请公布日期 2000.12.05
申请号 JP19990147737 申请日期 1999.05.27
申请人 C I KASEI CO LTD 发明人 IKEDA YASUHISA;KONO HIROYUKI
分类号 B29C47/00;B29C55/12;C08G63/181;C08G63/78;C08K3/36;C08L67/02;(IPC1-7):C08G63/181 主分类号 B29C47/00
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