发明名称 |
Semiconductor device and its manufacturing method |
摘要 |
To present a manufacturing method of semiconductor device capable of forming a homogeneous and highly reproducible gallium nitride crystal, comprising the steps of forming a zinc oxide layer on a monocrystalline substrate, forming a first gallium nitride crystal in a temperature range from 0 DEG C. to 900 DEG C., and forming a second gallium nitride crystal in a temperature range from 900 DEG C. to 2000 DEG C. |
申请公布号 |
GB2320365(B) |
申请公布日期 |
2002.01.02 |
申请号 |
GB19970023884 |
申请日期 |
1997.11.12 |
申请人 |
* MATSUSHITA ELECTRONICS CORPORATION |
发明人 |
MASAAKI * YURI;TETSUZO * UEDA;TAKAAKI * BABA |
分类号 |
H01L29/12;H01L21/20;H01L21/203;H01L21/205;H01S5/323 |
主分类号 |
H01L29/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|