| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning method which can reduce non-uniformity in removal efficiency of particles between lots with a simple procedure. SOLUTION: The substrate cleaning method comprises a step of increasing a concentration of gas dissolved in cleaning liquid in a cleaning tank 12 to a saturated concentration, and a step of irradiating ultrasonic waves to the cleaning liquid in the cleaning tank to clean a substrate W immersed in the cleaning liquid in the cleaning tank. In the step of increasing the dissolved gas concentration to the saturated concentration, the gas is supplied to the cleaning tank so as to increase the dissolved gas concentration of the cleaning liquid in the cleaning tank to the saturated concentration. Also in the step of increasing the dissolved gas concentration to the saturated concentration, the irradiation of the ultrasonic waves to the cleaning liquid in the cleaning tank is stopped. COPYRIGHT: (C)2009,JPO&INPIT
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