BLOCKCOPOLYMER NONOSTRUCTURES FORMED ON A PATTERN WHOSE SHAPE IS NOT COINCIDE WITH THAT OF THE BLOCKCOPOLYMER NONOSTRUCTURES AND METHOD FOR PREPARING THEREOF

摘要

A method for manufacturing self-assembly nanostructure of block copolymer is provided to implement various structures of nanostructures according to relative composition ratio and fraction of each block of the block copolymer or cycle of pattern. A method for manufacturing self-assembly nanostructure of block copolymer comprises steps of: forming neutral layer in substrate; patterning the substrate in which the neutral layer is formed the pattern having other cycle with the block copolymer; forming the block copolymer thin film in the patterned substrate; and inducing self-assembly by heat-treating the block copolymer and obtaining nanostructure. The neutral layer is organic single molecule layer. The organic single molecule layer is self-assembled monolayer or polymer brush layer.