| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition providing an excellent resist pattern having CD uniformity (CDU).SOLUTION: The compound is represented by formula (I). The resin has a structural unit derived from the compound. The resist composition and the method for producing the resist pattern are also provided. [In formula (I), Qand Qare each independently fluorine or 1-6C perfluoroalkyl; n is 0 or 1; Xis a single bond or 1-10C alkanediyl wherein the methylene constituting the alkanediyl may be substituted with oxygen or carbonyl, with the proviso that when n is 0, Xis not the single bond; W is a structure represented by a specific formula (1a1-1) or a specified formula (1a1-2); Ris hydrogen or methyl; and Zis an organic counter ion]. |
