发明名称 Process for electroless plating and a solution used for the same
摘要 A process of pretreatment for selective application of electroless metallization to a surface of a non-conductive material and a solution useful for the pretreatment are provided. The process achieves good coverage in areas to be plated on the surface of non-conductive materials without skip plating or over plating.
申请公布号 US9499910(B2) 申请公布日期 2016.11.22
申请号 US201514804455 申请日期 2015.07.21
申请人 Rohm and Haas Electronic Materials LLC 发明人 Yee Dennis Kwok-Wai;Tang Michael Chi-Yung;Bayes Martin W.;Yip Ka-Ming;Chan Chun-Man;Chan Hung-Tat;Li Tsui-Kiu;Liu Lok-Lok
分类号 B05D3/10;B05D3/06;C23C18/16;C23C18/18;C23C18/20;C23C18/30 主分类号 B05D3/10
代理机构 代理人 Piskorski John J.
主权项 1. A process for selective metallization, comprising the steps of: (a) preparing a surface of a non-conductive material by chemically or physically modifying the surface within areas to be plated; (b) contacting the non-conductive material with a pretreatment solution comprising a conditioning agent selected from the group consisting of polyoxyethylene alkyl phenol phosphate, polyether phosphate and phenol sulfonic acid, wherein the polyoxyethylene alky phenol phosphate is in amounts of 2.5 to 15 g/L, the polyether phosphate is in amounts of 2.5 to 15 g/L and the phenol sulfonic acid is in amounts of 2.5 to 25 g/L and 10 to 90 g/L of an alkali metal hydroxide; (c) contacting the non-conductive material with a catalyst solution comprising a catalytic palladium metal ion in amounts of 5 to 25 ppm, 50 to 150 g/L sulfuric acid and chloride ion; and (d) electrolessly plating those areas to be plated on the surface of the non-conductive material.
地址 Marlborough MA US