发明名称 |
SUBSTRATE WITH TRANSPARENT ELECTRODE AND METHOD FOR PRODUCING SAME |
摘要 |
Provided is a substrate with transparent electrode, which is capable of achieving both acceleration of crystallization during a heat treatment and suppression of crystallization under a normal temperature environment. In the substrate with transparent electrode, a transparent electrode thin-film formed of a transparent conductive oxide is formed on a film substrate. An underlayer that contains a metal oxide as a main component is formed between the film substrate and the transparent electrode thin-film. The underlayer and the transparent electrode thin-film are in contact with each other. The transparent electrode thin-film is amorphous, and the base layer is dielectric and crystalline. |
申请公布号 |
US2016351752(A1) |
申请公布日期 |
2016.12.01 |
申请号 |
US201515114639 |
申请日期 |
2015.01.19 |
申请人 |
KANEKA CORPORATION |
发明人 |
Kuchiyama Takashi;Hayakawa Hironori;Ueda Hiroaki;Motohara Yuji;Yamamoto Kenji |
分类号 |
H01L33/42;C23C14/35;C23C14/02;H01L31/0224;C23C14/08 |
主分类号 |
H01L33/42 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate with transparent electrode in which a transparent electrode thin-film formed of a transparent conductive oxide is formed on a film substrate, wherein
an underlayer containing indium oxide as a main component is formed between the film substrate and the transparent electrode thin-film, the underlayer is in contact with the transparent electrode thin-film, the transparent electrode thin-film is amorphous, and the underlayer is dielectric and crystalline. |
地址 |
Osaka-shi, Osaka JP |