发明名称 SUBSTRATE WITH TRANSPARENT ELECTRODE AND METHOD FOR PRODUCING SAME
摘要 Provided is a substrate with transparent electrode, which is capable of achieving both acceleration of crystallization during a heat treatment and suppression of crystallization under a normal temperature environment. In the substrate with transparent electrode, a transparent electrode thin-film formed of a transparent conductive oxide is formed on a film substrate. An underlayer that contains a metal oxide as a main component is formed between the film substrate and the transparent electrode thin-film. The underlayer and the transparent electrode thin-film are in contact with each other. The transparent electrode thin-film is amorphous, and the base layer is dielectric and crystalline.
申请公布号 US2016351752(A1) 申请公布日期 2016.12.01
申请号 US201515114639 申请日期 2015.01.19
申请人 KANEKA CORPORATION 发明人 Kuchiyama Takashi;Hayakawa Hironori;Ueda Hiroaki;Motohara Yuji;Yamamoto Kenji
分类号 H01L33/42;C23C14/35;C23C14/02;H01L31/0224;C23C14/08 主分类号 H01L33/42
代理机构 代理人
主权项 1. A substrate with transparent electrode in which a transparent electrode thin-film formed of a transparent conductive oxide is formed on a film substrate, wherein an underlayer containing indium oxide as a main component is formed between the film substrate and the transparent electrode thin-film, the underlayer is in contact with the transparent electrode thin-film, the transparent electrode thin-film is amorphous, and the underlayer is dielectric and crystalline.
地址 Osaka-shi, Osaka JP