发明名称 Cell carrier, associated methods for making cell carrier and culturing cells using the same
摘要 A carrier for expansion of pluripotent stem cells is provided, wherein the carrier comprises a substrate comprising one or more outer surfaces, wherein the one or more outer surfaces are modified with gas plasma treatment, and one or more structured indentations on one or more of the outer surfaces. The carrier has a length at least about 0.2 mm, a width at least about 0.2 mm, and a height in a range from about 0.05 mm to 1.2 mm and each of the structured indentations has a major axis in a range from about 0.1 mm to 0.5 mm, a minor axis in a range from about 0.1 mm to 0.5 mm and a depth in a range from about 0.025 mm to about 0.5 mm. A method of making the carrier, and culturing stromal cells using the same carrier are also provided.
申请公布号 US9518249(B2) 申请公布日期 2016.12.13
申请号 US201313839049 申请日期 2013.03.15
申请人 GENERAL ELECTRIC COMPANY 发明人 Davis Brian Michael;Loghin Evelina Roxana;Conway Kenneth Roger;Burns Andrew Arthur Paul;Gascoyne David Gilles
分类号 C12N5/0735;C12N5/00 主分类号 C12N5/0735
代理机构 Fletcher Yoder, P.C. 代理人 Fletcher Yoder, P.C.
主权项 1. A carrier for expansion of pluripotent stem cells, comprising: a planar substrate disc comprising a first surface and a second surface opposing the first surface and a plurality of structured indentations formed in the first surface and the second surface; wherein the first surface and the second surface are modified with gas plasma treatment, and wherein the planar substrate disc has a length at least about 0.2 mm, a width at least about 0.2 mm, and a height in a range from about 0.05 mm to 1.2 mm, wherein the height extends from a highest point of the first surface through the planar substrate disc and to a highest point of the second surface and each of the structured indentations has a major axis in a range from about 0.1 mm to 0.5 mm, a minor axis in a range from about 0.1 mm to 0.5 mm and a depth in a range from about 0.025 mm to 0.5 mm and wherein a first structured indentation of the plurality of structured indentations is aligned with a second structured indentation of the plurality of structured indentations in the planar substrate disc such that respective bottoms of the first structured indentation and the second structured indentation are separated by a portion of the planar substrate disc.
地址 Niskayuna NY US
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