| 主权项 |
1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holder for holding a substrate in a horizontal position; an opposing member that opposes an upper surface of said substrate and has an opposing-member opening in a central part; an opposing-member moving mechanism for holding said opposing member and moving said opposing member relative to said substrate holder in an up-down direction between a first position and a second position that is below said first position; a substrate rotation mechanism for rotating said substrate along with said substrate holder about a central axis pointing in said up-down direction; a processing liquid nozzle for supplying a processing liquid to said upper surface of said substrate through said opposing-member opening; and a gas supply part for supplying a treatment atmospheric gas to a space between said opposing member and said substrate, wherein said opposing member includes: an opposing-member body that opposes said upper surface of said substrate and has said opposing-member opening in the central part; an opposing-member tubular part that has a tubular shape and protrudes upward from a periphery of said opposing-member opening of said opposing-member body and in which said processing liquid nozzle is inserted; an opposing-member flange part that annularly extends radially outward from an upper end of said opposing-member tubular part and is held by said opposing-member moving mechanism; and a first uneven part in which a recessed portion and a raised portion are alternately disposed concentrically on an upper surface of said opposing-member flange part, said opposing-member moving mechanism includes: a holder lower part that opposes a lower surface of said opposing-member flange part in said up-down direction; a holder upper part that opposes said upper surface of said opposing-member flange part in said up-down direction; and a second uneven part in which a recessed portion and a raised portion are alternately disposed concentrically on a lower surface of said holder upper part, in a state in which said opposing member is located at said first position, said opposing-member flange part is supported from below by said holder lower part, and said opposing member is held by said opposing-member moving mechanism and spaced above said substrate holder, and in a state in which said opposing member is located at said second position, said opposing member is spaced from said opposing-member moving mechanism, is held by said substrate holder, and is rotatable along with said substrate holder by said substrate rotation mechanism, a labyrinth is formed as a result of the raised portion of one of said first uneven part and said second uneven part being disposed within the recessed portion of the other of said first uneven part and said second uneven part with a gap therebetween, and a seal gas is supplied to said labyrinth to seal a nozzle gap from a space located on the radially outer side of said labyrinth, said nozzle gap being a space between said processing liquid nozzle and said opposing-member tubular part. |
