发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
Disclosed is an exposure apparatus which includes an optical element (1), a gas supplying unit (4) for supplying a predetermined gas around the optical element (1), and an organic compound decomposition mechanism (7,8) for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element (1) without a necessity of using many filters in combination. <IMAGE>
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申请公布号 |
EP1102124(A2) |
申请公布日期 |
2001.05.23 |
申请号 |
EP20000310139 |
申请日期 |
2000.11.15 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TANABE, MASAYUKI;FUKUDA, YASUAKI;TSUKAMOTO, MASAMI |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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