| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD ingredient solution which is capable of reducing the amount of a solvent used in making a thin film by a solution vaporization CVD method and capable of being stably vaporized for a long time. SOLUTION: A 2,2,6,6-tetramethyl-3,5-octane-dione ligand containing metal complex represented by structural formula (I) is used as a metal-containing organic compound used as a solute of the ingredient solution. In structural formula (I), x is an integer of 0 to 4; y is an integer of 1 to 4; M is a metal or Ti=O wherein R is a 1 to 5C alkyl group; and M has a valence equal to x+y. COPYRIGHT: (C)2005,JPO&NCIPI
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