MANUFACTURING METHOD OF SILSESQUIOXANE-BASED INSULATION FILM

摘要

PROBLEM TO BE SOLVED: To provide a method capable of providing a silsesquioxane-based insulation film obtainable in a low-temperature process, high in electrical insulation quality, having an excellent surface texture. SOLUTION: This manufacturing method of a silsesquioxane-based insulation film includes processes of: preparing a solution containing alkoxysilane, an acid catalyst for facilitating hydrolysis of the alkoxysilane, water and a first aprotic solvent; hydrolyzing the solution by keeping it at 0-50°C; advancing hydrolytic polycondensation by keeping the solution at 50-70°C after the hydrolysis; depressurizing to remove at least the acid catalyst and a by-product after advancing the hydrolytic polycondensation; applying the solution after the depressurization; and forming the silsesquioxane-based insulation film by burning the applied solution at 150-170°C. COPYRIGHT: (C)2009,JPO&INPIT