发明名称 Plasma resistant ceramic coated conductive article
摘要 To manufacture a ceramic coated article, at least one surface of a conductive article is roughened to a roughness of approximately 100 micro-inches (μin) to approximately 300 μin. The conductive article may then be heated and coated with a ceramic coating comprising a yttrium containing oxide to a thickness of approximately 10-40 mil.
申请公布号 US9394615(B2) 申请公布日期 2016.07.19
申请号 US201213687512 申请日期 2012.11.28
申请人 Applied Materials, Inc. 发明人 Sun Jennifer Y.;Kanungo Biraja P.;Duan Ren-Guan;Noorbakhsh Hamid;Yuh Junhan;Lubomirsky Dmitry
分类号 C23F1/08;B05D3/00;B23K10/00;H05K1/05;H01J37/32;C04B41/87;C04B5/00;C04B7/32;C04B18/02;C04B28/06;C04B35/44;C22C32/00;C22C29/12;B32B18/00;C04B41/50;C04B41/00 主分类号 C23F1/08
代理机构 Lowenstein Sandler LLP 代理人 Lowenstein Sandler LLP
主权项 1. A component of a plasma etch reactor comprising: a metal portion of the component having a roughened surface with a roughness of approximately 100 micro-inches (μin) to approximately 300 μin, wherein the metal portion of the component comprises a first region and a second region thermally isolated from the first region by a thermal break; and a ceramic coating on the roughened surface of the metal portion of the component, wherein the ceramic coating comprises a yttrium containing oxide, the ceramic coating having a thickness of approximately 10-40 mil, wherein the ceramic coating has a thermal shock resistance sufficient for use at a temperature of up to approximately 150 degrees Celsius.
地址 Santa Clara CA US