发明名称 Apparatus for measuring thickness of thin film, system including the apparatus, and method for measuring thickness of thin film
摘要 An apparatus and a system for measuring the thickness of a thin film are provided. The apparatus includes a signal detector, a Fast Fourier Transform (FFT) generator, an Inverse Fast Fourier Transform (IFFT) generator, and a thickness analyzer. The signal detector detects an electric field signal with respect to a reflected light that is reflected from a thin film. The FFT generator performs FFT with respect to the electric field signal to separate a DC component from an AC component of the electric field signal. The IFFT generator receives the separated AC component of the electric field signal, performs IFFT with respect to the AC component, and extracts a phase value of the AC component. The thickness analyzer measures the thickness of the thin film using the extracted phase value.
申请公布号 US9417055(B2) 申请公布日期 2016.08.16
申请号 US201514799107 申请日期 2015.07.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Ryu Sung-Yoon;Lee Sang-Kil;Jun Chung-Sam;Ko Woo-Seok;Kwak Ho-Jeong;Kim Souk;Ryu Kwan-Woo;Yang Yu-Sin
分类号 G01B11/28;G01B11/06 主分类号 G01B11/28
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An apparatus for measuring a thickness of a thin film, the apparatus comprising: a signal detector configured to detect an electric field signal with respect to a reflected light that is reflected from a thin film; a Fast Fourier Transform (FFT) generator configured to perform FFT with respect to the electric field signal to separate a direct current (DC) component and an alternating current (AC) component of the electric field signal from each other; an Inverse Fast Fourier Transform (IFFT) generator configured to receive the separated AC component of the electric field signal, perform IFFT with respect to the AC component, and extract a phase value of the AC component; and a thickness analyzer configured to measure the thickness of the thin film using the phase value.
地址 Suwon-si KR