Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

摘要

The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises at least one first array of first polarization-influencing elements and a second array of second polarization-influencing elements, wherein the first and second arrays are arranged successively in the light propogation direction, wherein the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field, and wherein the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells.

主权项

1. An optical system, comprising:
a polarization influencing optical arrangement, comprising:
a first array comprising first transverse Pockels cells;a second array comprising second transverse Pockels cells; anda plurality of electrodes configured to generate an electric field, wherein:
the first and second arrays are arranged successively in a direction that light propagates through the system during use of the system;the first transverse Pockels cells have an electric-field dependent birefringence;the second transverse Pockels cells have an electric-field dependent birefringence;the electrodes are in each case arranged on mutually opposite sides of the first transverse Pockels cells and of the second transverse Pockels cells;the electrodes arranged on the first array are oriented at a non-zero angle relative to the electrodes arranged on the second array; andthe optical system is a microlithographic optical system.