| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | ||
| 申请公布号 | US9457947(B2) | 申请公布日期 | 2016.10.04 |
| 申请号 | US201213651274 | 申请日期 | 2012.10.12 |
| 申请人 | ASML HOLDING N.V. | 发明人 | Lansbergen Robert Gabriël Maria;Kochersperger Peter C.;Ramirez David;Xiong Xugang;Harrold George Hilary;Sinharoy Arindam |
| 分类号 | G03B27/72;B65D81/02;G03F7/20;G03F1/24;G03F1/66;H01L21/673;B65B5/04 | 主分类号 | G03B27/72 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. An apparatus, comprising: a base configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; and a cover couplable to the base, the cover comprising a restraining mechanism that, upon an application of a force external to the cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device and applied via a structure of the restraining mechanism arranged to only contact a side of the patterning device transverse to the patterning surface, the side having an edge, and arranged to apply the in-plane force without substantial sliding contact between the structure and the side and edge of the patterning device. | ||
| 地址 | Veldhoven NL | ||