| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to prevent splash defects and generation of fine particles by integrating diffuser frame with diffuser, thereby preventing generation of arc. CONSTITUTION: The chemical vapor deposition apparatus comprises a chamber(100); a susceptor(40) which is positioned in the chamber, and on which a glass substrate(50) is rested; a diffuser(70) which is installed in such a way that the inside of the chamber is divided into upper space and lower space by the diffuser, and on which a plural injection holes(70a) are formed so that the upper space and the lower space are connected to each other through the injection holes; a gas injection pipe(80a) for injecting gas into the chamber through the injection holes of the diffuser; and a ceramic frame(5) installed between the chamber and the diffuser, wherein a circumferential part of the diffuser is extended to the partial surface of the ceramic frame, wherein the circumferential part of the diffuser is formed in an "L" character shape, and wherein the diffuser is formed of aluminum or stainless steel.
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