| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for an inkjet head, wherein a mask material preventing the occurrence of a defect such as a pinhole can be used and which uses an etching method wherein highly reliable etching can be performed, and the inkjet head. SOLUTION: In this manufacturing method for the inkjet head, an etching mask composed of a dielectric film 2 is used on a silicon substrate 1 so that an ink supply port, which penetrates the silicon substrate 1 equipped with an electrothermal transducer for ejecting ink, can be provide by anisotropic etching. The manufacturing method comprises: a process (process a) wherein a polyetheramide resin layer 3 is formed on the dielectric film 2; a process (process b) wherein an opening pattern similar to that of the dielectric film 2 is formed in the dielectric film 2 and the layer 3; and a process (process c) wherein the substrate is etched according to the opening pattern so that the ink supply port can be provided. COPYRIGHT: (C)2005,JPO&NCIPI
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