发明名称 METHOD OF FORMING STRUCTURIZED COATING PART ON SUBSTRATE AND COATED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method of improving a technique associated with formation of a structurized coating part on a substrate.SOLUTION: The present invention relates to a method of forming a structurized coating part on a substrate, the method including the steps of: preparing a substrate 1 having a surface to be coated; laminating a first layer 72 on the substrate; laminating a second layer 70 on the first layer; and laminating a third layer 71 on the second layer. The first, second and third layers are respectively formed by laminating vapor-deposited coating substances, the vapor-deposited coating substances being selected out of aluminum oxide, silicon dioxide, silicon nitride and titanium dioxide. In the method, a thermal vapor-deposition method for the vapor-deposited coating substances is implemented, and the second layer is structurized by an additive structurizing method, the thermal vapor-deposition method being implemented as plasma accelerated thermoelectron beam vapor deposition. Further, the vapor-deposited coating substances of the first layer has a lower optical refractive index than the vapor-deposited coating substances of the second layer, and the vapor-deposited coating substances of the third layer has a lower optical refractive index than the vapor-deposited coating substances of the second layer.SELECTED DRAWING: Figure 7
申请公布号 JP2016166425(A) 申请公布日期 2016.09.15
申请号 JP20160086128 申请日期 2016.04.22
申请人 MSG LITHOGLAS AG 发明人 JUERGEN LEIB;ULLI HANSEN;SIMON MAUS
分类号 C23C14/04 主分类号 C23C14/04
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