发明名称 |
Membrane mask for projection lithography |
摘要 |
An improved, scattering-type mask for use in a charged-particle beam lithography process comprises the mask having a membrane portion and a scattering portion, the membrane portion being fabricated with a conductive material or a plurality of materials in which one of them is conductive. The conductive nature of the membrane portion mitigates the accumulation of charge in the mask, thereby enhancing the definition of the charged-particle pattern transferred from the mask onto the wafer under fabrication and reducing the distortion obtained with the system.
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申请公布号 |
US5985493(A) |
申请公布日期 |
1999.11.16 |
申请号 |
US19980057420 |
申请日期 |
1998.04.08 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
LIDDLE, JAMES ALEXANDER;NOVEMBRE, ANTHONY EDWARD;WEBER, GARY ROBERT |
分类号 |
H01L21/027;G03F1/14;G03F1/16;(IPC1-7):G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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