| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing/cleaning method for solid fine particles and contaminants which cannot be removed by a cleaning operation with a normal cleaning liquid or where no brush or abrasive can be used or no sufficient effect is expected with them. SOLUTION: The gas hydration of a normal cleaning liquid or the partial solidification of the cleaning liquid forms the slurry of volatile material containing solid particles. The slurry is jetted against an object to be polished/cleaned, so that no solid particle remains on the object after polishing/cleaning while the collision of solid particles of the slurry raises a polishing/cleaning effect as well as the cleaning effect of the cleaning liquid. COPYRIGHT: (C)2005,JPO&NCIPI
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