EXPOSURE APPARATUS, METHOD FOR MANUFACTURING EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING MICRODEVICE

摘要

Disclosed is an exposure apparatus wherein a pattern formed on a mask (M) is transferred onto a photosensitive substrate (P) by light exposure through a projection optical system (PL). This exposure apparatus comprises an upper mount (26) on which at least one of a mask stage (MST) supporting the mask (M) or the projection optical system (PL) is mounted, and a plurality of lower mounts (6a) supporting the upper mount (26) while having their longitudinal directions oriented in a certain direction.