发明名称 |
Silicon Nanosheet , Nanosheet Solution and Process for Producing the Same, Nanosheet -Containing Composite, and Nanosheet Aggregate |
摘要 |
A silicon nanosheet comprising a silicon atom layer formed by bonding two-dimensionally and periodically arranged silicon atoms to each other through an Si-Si bond. A nanosheet solution prepared by dispersing or suspending the silicon nanosheets in a solvent. A nanosheet-containing composite having the silicon nanosheets on the surface and/or in the interior of a substrate. A nanosheet aggregate formed by aggregating the silicon nanosheets. A process for producing a nanosheet solution comprising: an acid treatment step of bringing a layered silicon compound into contact with an aqueous acid solution to derive a siloxene compound; and an exfoliation step of adding the siloxene compound into a solvent containing a surfactant, shaking the mixture, and peeling off the siloxene compound.
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申请公布号 |
US2008050573(A1) |
申请公布日期 |
2008.02.28 |
申请号 |
US20050628031 |
申请日期 |
2005.07.14 |
申请人 |
KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO |
发明人 |
NAKANO HIDEYUKI;NAKAMURA HIROSHI;MITSUOKA TAKUYA;AKIMOTO YUSUKE;SUDO EIICHI |
分类号 |
B32B9/00;C01B15/14 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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