| 摘要 |
In the present invention, an alignment system is provided with an alignment system (50) that includes: an objective optical system (60) having an objective transparent plate (62) which faces a wafer (W) that can move in a Y-axis direction; a projection system (70) that scans measurement light (L1, L2) in the Y-axis direction and while doing so projects the measurement light (L1, L2), via the objective transparent plate (62), onto grid marks (GM) disposed on the wafer (W); and a light receiving system (80) that receives, via the objective optical system (60), diffraction light ±L3, ±L4 which is from the grid marks (GM) and is of the measurement light (L1, L2). The alignment system is also provided with a calculation system that finds position information of the gird mark (GM) on the basis of the output of the light receiving system (80). The objective transparent plate (62) deflects or diffracts the diffraction light ±L3, ±L4, which was diffracted by the grid marks (GM), towards the light receiving system (80). |
