PROCESS CONTROL DEVICE, RECORDING MEDIUM, AND PROCESS CONTROL METHOD

摘要

According to one embodiment, a process control device includes an emission amount calculation unit and a process control unit. The emission amount calculation unit selects light of a predetermined wavelength among light generated while a dry etching process is being executed on a substrate. The process control unit calculates an integral value which is obtained by integrating an emission intensity of the selected light with time of detecting the selected light. Further, the process control unit calculates a total amount of the integral value as a total emission amount at the substrate. Further, the process control unit outputs an instruction to stop the dry etching process when the total emission amount reaches a predetermined reference value.

主权项

1. A process control device, comprising:
an emission amount calculation unit configured to select light of a predetermined wavelength among light generated while dry etching process using plasma is being executed on a substrate, calculate an integral value which is obtained by integrating an emission intensity of the selected light with time of detecting the selected light, and calculate a total value of the integral value as a total emission amount at the substrate; and a process control unit configured to output an instruction to stop the dry etching process when the total emission amount reaches a predetermined reference value.