发明名称 |
RF SPUTTERING ARRANGEMENT |
摘要 |
Apparatus for sputtering comprises a vacuum chamber, at least one first electrode having a first surface arranged in the vacuum chamber, a counter electrode having a surface arranged in the vacuum chamber and a RF generator. The RF generator is configured to apply a RF electric field across the at least one first electrode and the counter electrode so as to ignite a plasma between the first electrode and the counter electrode. The counter electrode comprises at least two cavities in communication with the vacuum chamber. the cavities each have dimensions such that a plasma can be formed in the cavity. |
申请公布号 |
EP2382648(B1) |
申请公布日期 |
2016.10.05 |
申请号 |
EP20090805942 |
申请日期 |
2009.12.21 |
申请人 |
OERLIKON ADVANCED TECHNOLOGIES AG |
发明人 |
WEICHART, JÜRGEN;FELZER, HEINZ |
分类号 |
H01J37/32;H01J37/34 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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