发明名称 METHOD OF MANUFACTURING SHADOW MASK
摘要 A method of perforating through pores by etching in the manufacture of a shadow mask. This perforating method comprises the steps of selectively covering both surfaces of a thin metal plate with etching resistant film except a predetermined pore region; performing an etching to form recesses on the opening region of one surface of the metal plate; covering the one surface of the metal plate with an etching resistance material; etching the opening region of the other surface of the metal plate until the bottom of the etching resistance material buried in the recesses of the one surface of the metal plate is exposed; exposing both surfaces of the metal plate including the through holes by removing the etching resistant film and the etching resistant material; and etching the exposed surfaces of the metal plate again by contacting the exposed surface with an etchant.
申请公布号 EP0173966(A3) 申请公布日期 1986.12.30
申请号 EP19850110891 申请日期 1985.08.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHTAKE, YASUHISA C/O PATENT DIVISION;KUDOU, MAKOTO C/O PATENT DIVISION;SENGOKU, YASUSHI C/O PATENT DIVISION
分类号 C23F1/00;C23F1/02;H01J9/14;H01J29/07;(IPC1-7):H01J9/14 主分类号 C23F1/00
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