PRODUCTION OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: To provide a technique for expanding the application range of reticles to be used in a semiconductor production stage. CONSTITUTION: Plural alignment marks 4 corresponding to the plural kinds of layers formed on a semiconductor wafer by using different kinds of masks or reticles, plural alignment marks 4b corresponding to plural layers formed on the semiconductor wafer by using exposure devices of different kinds and plural alignment marks 4a corresponding to the semiconductor wafers of different diameters are formed on the reticule, by which exact alignment is executed and the waste of producing the plural reticles having the same patterns is eliminated.