| 摘要 |
PROBLEM TO BE SOLVED: To provide a lighter ion implantation device of high reliability having a scanning arm assembly allowing a wafer holder to rotate round a wafer axis. SOLUTION: This ion implantation device has a scanning arm 11 stretching along the first axis 12 and processes a single piece of semiconductor wafer 18 continuously. On the free end of the arm 11 the wafer holder 10 is mounted rotatably round the second axis perpendicular to the wafer surface in such a way as having its center on the wafer surface. The wafer 18 can be scanned through an ion beam 13 by reciprocating the arm 11 across the first axis 12. A motor is mounted in the scanning arm 11 near the free end in such a way that its rotary shaft is parallel with the first axis and perpendicular to the second axis. A right angle rotation drive device connects the motor with the wafer holder 10. A hard stop is installed on the motor to prevent the wafer 18 from rotating exceeding 360 degs.
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